How thick a silicon dioxide layer will formed inside silicon, Chemistry

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How thick a silicon dioxide layer will formed inside silicon

Problem

1. What will be the implant time for a 200 mm diameter wafer, when arsenic ions are implanted with doses of 10¹⁵/cm² and implant current of 100µA?

2. What is the range of 20 keV ¹¹B + and ⁴⁹BF₂ + ions?

3. How thick a silicon dioxide layer will be formed inside the silicon when the implant dose is 2 × 10¹⁸/cm² in SIMOX?

The response should include a reference list. Double-space, using Times New Roman 12 pnt font, one-inch margins, and APA style of writing and citations.

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