What is smallest possible feature size that can be written


Problem

1. How deep will (a) 10 keV e-beam penetrate into silicon and (b) 50 keV beam into quartz?

2. What is the smallest possible feature size that can be written with a 50 keV electron beam?

3. What is the photo mask writing time for a gigabit circuit with 1 000 000 000 contact holes, when the incrementing rate is 500 MHz and mask plate area 8 cm × 8 cm? The photo mask is 4X the final size.

The response should include a reference list. Double-space, using Times New Roman 12 pnt font, one-inch margins, and APA style of writing and citations.

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