If you want to leave 50 nm of si after silicidation to
For 0.35-pm technology, the junction depth (before silicidation) is about 100nm.
If you want to leave 50 nm of Si after silicidation to ensure low leakage current, how much TISi2 is formed and how much Ti is needed if all is consumed?
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a sourcedrain implant is done with arsenic with a dose of 1 x 1015 cm-2 and an energy of 40 keya titanium silicide
for 035-pm technology the junction depth before silicidation is about 100nmif you want to leave 50 nm of si after
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al spiking of si would not be a problem if the si diffusion in al were small and little si diffused into the al leaving
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