1. What should the oxygen flow be in a horizontal batch furnace to make sure that oxidation is not mass transfer-limited? Write out and justify the assumptions you need in your solution.
2. If reproducibility and other uncertainties in a batchloading furnace limit the shortest practical oxidation time to 15 min, what is the thinnest gate oxide that can be grown at 1000 ?C, at 950 ?C, at 900 ?C and 850 ?C? What are the corresponding CMOS linewidths?