If photoresist stripping in a 30 000 wpm fab is 5050


1. If photoresist stripping in a 30 000 WPM fab is 50/50 between wet tanks and single-wafer plasma strippers, how many wet benches and plasma strip tools are needed? Make assumptions about throughputs based on similar processes/tools.

2. If a 30 000 WPM fab has four gate oxidation tubes, what is their average utilization?

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Econometrics: If photoresist stripping in a 30 000 wpm fab is 5050
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