Establish a control procedure that will generate false


A particle counting device monitors wafers emerging from a plasma etcher. From previous experience, it is known that the machine generates an average of two defects per wafer. Establish a control procedure that will generate false alarms only 1% of the time (there is no lower control limit). What is the best type of control chart, and what is the necessary UCL?

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Chemistry: Establish a control procedure that will generate false
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