Compute the solution of the given problem
Problem- A cylindrical parallel-plate RF etch chamber is constructed with 12-in.-diameter electrodes. The chamber diameter is 19 in. and the height of the chamber is 6 in. One of the electrodes is attached to ground. The dc voltage between the electrodes is measured to be 20V when plasma is established. Assuming that the plasma is in contact with the chamber walls.
Part 1- Calculate the potential difference between the plasma and each electrode and explain the significance of the result.
I want help to determine the potential difference between the plasma and each electrode.