Very conformal deposition is obtained but the dop is 0, Other Engineering

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Very conformal deposition is obtained but the dop is 0

A SiO₂layer is deposited by LPCVD over a single 1-nm-wide. 0.5-p.m-high metal line.

The deposition flux and time are such that 0.25 µm of SiO₂ would be deposited on a flat surface.

The sticking coefficient for this process is 0.01 and the arrival angle distribution parameter n is equal to 1.

Very conformal deposition is obtained, but the DOP is 0. Would changing it or Sr improve (increase) the DOP? Explain.

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Other Engineering: Very conformal deposition is obtained but the dop is 0

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Other Engineering: Very conformal deposition is obtained but the dop is 0

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