Should this line fail due to electromigration what is the, Other Engineering

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Should this line fail due to electromigration what is the

An Al interconnect line has polygranular clusters that are all equal or less than 5 µm long, and a current density of 0.5 MA cm^-2 is passed through it.

If the critical stress for failure is 0.4 X 10⁹ dyne cm^-2 (and let Z. equal-6).

Should this line fail due to electromigration? What is the critical current density below which electromigration failure will not occur for this line?

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