Table presents the thickness of a metal layer on 100 silicon wafers resulting from a chemical vapor deposition (CVD) process in a semiconductor plant. Construct a histogram for these data.
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TABLE 3.2
|
|
Layer Thickness (Å) on Semiconductor Wafers
|
|
438
|
450
|
487
|
451
|
452
|
441
|
444
|
461
|
432
|
471
|
|
413
|
450
|
430
|
437
|
465
|
444
|
471
|
453
|
431
|
458
|
|
444
|
450
|
446
|
444
|
466
|
458
|
471
|
452
|
455
|
445
|
|
468
|
459
|
450
|
453
|
473
|
454
|
458
|
438
|
447
|
463
|
|
445
|
466
|
456
|
434
|
471
|
437
|
459
|
445
|
454
|
423
|
|
472
|
470
|
433
|
454
|
464
|
443
|
449
|
435
|
435
|
451
|
|
474
|
457
|
455
|
448
|
478
|
465
|
462
|
454
|
425
|
440
|
|
454
|
441
|
459
|
435
|
446
|
435
|
460
|
428
|
449
|
442
|
|
455
|
450
|
423
|
432
|
459
|
444
|
445
|
454
|
449
|
441
|
|
449
|
445
|
455
|
441
|
464
|
457
|
437
|
434
|
452
|
439
|