A new process has been developed for spin coating, Chemistry

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A new process has been developed for spin coating

A new process has been developed for spin coating photoresist. Ten wafers have been tested with the new process, and the results of thickness measurements (in µm) are shown below and are assumed to be IIDN. Find a 99% confidence interval on the mean photoresist thickness.

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Chemistry: A new process has been developed for spin coating

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Chemistry: A new process has been developed for spin coating

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